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Single-Zone High-Temperature CVD System, 1700 °C
CHEMICAL VAPOR DEPOSITION EQUIPMENT
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LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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The 1700 °C temperature class requires a controlled laboratory environment with adequate ventilation and thermal shielding. Gas-flow and vacuum package selection must be confirmed by quotation before installation.
- Utility Requirements: Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power, and power supply during quotation to ensure compatibility with facility infrastructure.
- Process Atmosphere Constraints: Gas supply, vacuum, and tube-furnace configuration must be matched to the intended chemical vapor deposition process to prevent contamination or incomplete reaction.
Follow these steps to verify system configuration and prepare the furnace for first operation. Each action ensures safe and accurate process initialization before deposition runs.
Required Equipment: Vacuum pump package (as quoted), Mass flow controller (100, 200, or 500 sccm as configured), Power supply matching system voltage
- Confirm Configuration
Confirm the tube size, heating-zone layout, gas-flow channels, vacuum pump package, RF source, and power supply match the quoted specification before connecting utilities. - Connect Gas Supply
Connect the inert or reactive gas line to the mass flow controller inlet using appropriate fittings and check for leaks at all joints. - Establish Vacuum
Attach the vacuum pump package to the furnace outlet and evacuate the system to the base pressure specified in the equipment manual. - Set Temperature Profile
Program the single-zone controller to the desired ramp rate and hold temperature, ensuring the setpoint does not exceed the 1700 °C maximum rating. - Purge Atmosphere
Purge the tube with the process gas at the selected flow rate for a minimum of 10 minutes before initiating the heating ramp.
What is the maximum operating temperature of the Atomfair CV-1700-1U single-zone CVD system, and what materials can be grown at that temperature?
The system is rated for a 1700 °C temperature class, enabling high-temperature chemical vapor deposition processes such as thin-film deposition and two-dimensional material growth. This temperature range supports semiconductor-material preparation and controlled-atmosphere laboratory process development.
What gas flow rate options are available for the CV-1700-1U, and how do they affect process control?
The standard-equipment manual lists gas flow range options of 100 sccm, 200 sccm, and 500 sccm. The appropriate flow rate should be selected based on the specific deposition or growth process to maintain uniform precursor delivery and reaction kinetics.
What infrastructure requirements (power supply, vacuum, and gas supply) must be confirmed before installation?
The product description states that the power supply, vacuum pump package, and gas supply configuration must be confirmed by quotation. Contact technical sales to specify the required accessories and ensure compatibility with your laboratory setup.
This single-zone 1700 °C CVD system is designed for R&D-scale thin-film deposition and controlled-atmosphere material growth, offering flexible gas flow options and high-temperature capability for advanced materials synthesis, but requires careful configuration specification and external infrastructure for operation.
Positive
- High-temperature capability up to 1700 °C: Enables chemical vapor deposition of high-melting-point materials, including two-dimensional material growth and semiconductor thin-film preparation at elevated temperatures.
- Flexible gas flow range options: Available mass flow controller configurations of 100, 200, or 500 sccm allow tuning of precursor delivery for different deposition chemistries and growth rates.
Trade-offs
- Configuration-dependent ordering: The system requires specification of tube size, heating-zone arrangement, gas-flow channels, and vacuum pump package before final quotation, making it a custom-configured system rather than a standard off-the-shelf unit.
- Laboratory infrastructure requirements: Operation requires external gas supply, vacuum pump, and power supply not included as standard, placing infrastructure demands on the receiving laboratory.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
