|
Silicon（IV）Oxide (SiO2) Evaporation Material, Pieces, 99.99%, 1-3 mm
Product Type: Compound Evaporation Material
Research-grade laboratory product
|
|||||||||||||||||||||||||||||||||||||||
|
|||||||||||||||||||||||||||||||||||||||
|
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
|
|||||||||||||||||||||||||||||||||||||||
|
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
|
Silicon(IV) oxide evaporation material requires vacuum deposition with electron-beam or thermal evaporation, using compatible hearth liners or boats. The material's melting point of 1610°C and density of ~2.65 g/cm³ must be considered for source loading and evaporation rate control.
- Evaporation Source Compatibility: E-beam evaporation is preferred for SiO2; thermal evaporation may be considered only after RFQ evaluation due to the material's high melting point.
- Hearth and Boat Liner Requirements: Use graphite, Al2O3, or BN liners in an e-beam hearth, or tungsten, molybdenum, or tantalum boats to avoid chemical reaction with the molten material.
- Film Thickness Monitoring: The Z-ratio of 1.00 allows direct quartz crystal microbalance thickness measurement without correction factor.
- Process Verification: Confirm deposition source geometry and material purity (99.99%) before quotation to ensure consistent film quality.
Why is E-beam evaporation the preferred method for SiO2 pieces, and under what conditions can thermal evaporation be used?
E-beam evaporation is preferred for SiO2 due to its high melting point (1,610°C) and excellent performance with an E-beam hearth using graphite/Al2O3/BN liner or W/Mo/Ta boat. Thermal evaporation is possible only by RFQ (request for quotation) because the material's high melting point and low vapor pressure require the higher energy density of an electron beam for efficient deposition without thermal decomposition.
What liner or boat materials are compatible with SiO2 evaporation to avoid contamination or degradation?
Compatible liners for E-beam hearths include graphite, aluminum oxide (Al2O3), and boron nitride (BN). For thermal evaporation boats, tungsten (W), molybdenum (Mo), and tantalum (Ta) are specified. Additionally, tantalum and graphite are listed as sheet2 hardware options, and Al2O3 is also noted. These materials are selected to withstand the high temperature and avoid chemical reaction with molten SiO2.
What documentation and verification steps are required before ordering SiO2 evaporation material for laboratory use?
Before ordering, confirm the model (AF-SIO2PCS-4N13MM), purity (99.99%), form (pieces), size range (1–3 mm), pack size, and deposition-source compatibility. Required documentation includes a certificate of analysis, safety data sheet, and review of shipment conditions and export requirements against laboratory use standards to ensure the material meets the specific requirements for vacuum thin-film deposition.
Silicon(IV) Oxide (SiO2) evaporation material in 1-3 mm pieces at 99.99% purity is optimized for E-beam evaporation with excellent performance using graphite/Al2O3/BN liners or refractory metal boats, though thermal evaporation requires RFQ and the 1,610°C melting point and Z-ratio of 1.00 impose specific deposition rate calibration and source compatibility constraints.
Positive
- High-purity 99.99% SiO2 pieces: The 99.99% purity specification minimizes contamination in thin-film deposition, supporting consistent optical and dielectric film properties for research-grade applications.
- Excellent E-beam evaporation performance: Rated as excellent for E-beam evaporation with compatibility across graphite, Al2O3, BN liners, and W/Mo/Ta boats, providing flexibility in deposition source hardware selection.
Trade-offs
- Thermal evaporation requires RFQ: Thermal evaporation is not standard and must be requested via RFQ, limiting direct process integration for labs relying on thermal sources without prior qualification.
- High melting point and Z-ratio constraints: With a melting point of 1,610°C and Z-ratio of 1.00, deposition rate monitoring and source power management require careful calibration to avoid process instability or film non-uniformity.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
