Plasma-Assisted CVD System CV-1200-1V 1200°C ATOMFAIR®

$15,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Plasma-assisted CVD system for thin-film deposition and 2D material growth, with 1200 °C class furnace and 100/200/500 sccm gas-flow options. Order now.

Plasma-Assisted CVD System, 1200 °C

CHEMICAL VAPOR DEPOSITION EQUIPMENT

Product Overview

Plasma-Assisted CVD System, 1200 °C is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications

Parameter	Specification / Available Values
Atomfair Model	CV-1200-1V
Product Family	CVD and related standard thermal-processing equipment
Temperature Class	1200 °C
Gas Flow Range	100 sccm, 200 sccm and 500 sccm options are shown in the updated standard-equipment manual.
Atmosphere/Vacuum Package	Gas supply, vacuum and tube-furnace configuration should be confirmed by quotation.
Process Use	CVD, thin-film preparation and controlled-atmosphere material growth.

Configuration Highlights

Latest standard-equipment brochure reviewed for CVD-family replacement and naming consistency.
The public product name keeps Atomfair branding and uses temperature, zone count or process role to distinguish similar CVD systems.
Factory model strings and supplier branding are kept out of public title and HTML.

APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.

PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.

IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.

LABORATORY PROCUREMENT SUPPORT

For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com

Manufacturer: Atomfair LLC

Brand: ATOMFAIR®

The system requires confirmed configuration of tube size, heating-zone layout, gas-flow range, vacuum package, RF power, and power supply before operation. Operation must be limited to controlled-atmosphere CVD and thin-film deposition processes as specified.

Tube and Heating Zone Configuration: Confirm the usable tube size and heating-zone arrangement prior to setup.
Gas Flow and Vacuum Package: Select compatible gas-flow range (100, 200, or 500 sccm) and vacuum pump package as per quotation.
RF Power and Power Supply: Verify RF source and power supply specifications match the system requirements.
Accessory Compatibility: Use only confirmed accessories and protective packaging for handling and storage.
Atmosphere Control: Operate only under controlled atmosphere or vacuum conditions as intended for CVD processes.

FAQ

What is the maximum process temperature of the Atomfair Plasma-Assisted CVD System and what does this imply for thin-film deposition?

The Atomfair Plasma-Assisted CVD System is rated for a maximum process temperature of 1200 °C. This temperature class supports chemical vapor deposition, thin-film preparation, and controlled-atmosphere material growth in laboratory R&D workflows. The 1200 °C rating indicates the upper thermal limit for the furnace configuration, but the usable tube size, heating-zone layout, and gas-flow range must be confirmed before quotation.

Which gas flow range options are available for the Atomfair CV-1200-1V plasma-assisted CVD system?

The Atomfair CV-1200-1V offers gas flow range options of 100 sccm, 200 sccm, and 500 sccm as shown in the updated standard-equipment manual. The specific gas flow configuration should be confirmed with the technical sales team before quotation to ensure it matches your process requirements.

What are the key configuration details that must be confirmed before purchasing the Atomfair CV-1200-1V?

Before purchasing the Atomfair CV-1200-1V, you must confirm the usable tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF power source (where applicable), power supply, and required accessories. These configuration details are essential to ensure the system meets your specific CVD process needs and laboratory infrastructure.

Assessment

The Atomfair CV-1200-1V Plasma-Assisted CVD System offers a 1200°C temperature class and selectable gas flow ranges for laboratory R&D in thin-film deposition and controlled-atmosphere materials growth, but requires buyer confirmation of tube size, heating zone, gas system, vacuum, and RF source, making it a configurable rather than turnkey solution.

Positive

1200°C Temperature Class: The system operates at up to 1200°C, enabling high-temperature CVD processes for thin-film deposition and materials growth in controlled atmospheres.
Multiple Gas Flow Options: Gas flow range options of 100, 200, and 500 sccm provide flexibility for various CVD precursor delivery and reaction conditions.

Trade-offs

Configuration Must Be Confirmed: Critical parameters such as tube size, heating-zone layout, gas channels, vacuum pump, and RF source are not pre-fixed and must be confirmed with the manufacturer before quotation, requiring buyer engagement in system specification.
Plasma Source Not Standard: RF power source for plasma assistance is listed as applicable only where needed, meaning the system may require additional sourcing and integration if plasma-enhanced deposition is intended.

Quality Standards & Performance Verification

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Shipping & Returns

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).