Small Intelligent PECVD System 150 W RF PV-1200-22 ATOMFAIR®

$25,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

PV-1200-22 intelligent PECVD system with 150 W RF, integrated vacuum and gas supply, heating furnace, and touch-screen control for thin-film R&D. Order now.

Small Intelligent PECVD System, 150 W RF

PLASMA-ENHANCED DEPOSITION EQUIPMENT

Product Overview

Small Intelligent PECVD System, 150 W RF is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its process layout, heating-zone configuration and gas/vacuum package.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications

Parameter	Specification / Available Values
Atomfair Model	PV-1200-22
Product Family	Intelligent type PECVD
Temperature Class	Confirm by quotation.
RF Source	touch-screen integrated control
Integrated Modules	Vacuum unit, gas supply system, RF source, automatic propulsion and heating furnace configuration.
Control Interface	Touch-screen integrated control is indicated for intelligent PECVD configurations.

Configuration Highlights

Latest PECVD brochure reviewed for row-level product identity.
PECVD configurations are distinguished by rotational, sliding, double-zone, three-zone, compact or preheating-assisted process layout.
RF source class and intelligent control notes are shown only as quotation-critical configuration points.

APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.

PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.

IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.

LABORATORY PROCUREMENT SUPPORT

For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com

Manufacturer: Atomfair LLC

Brand: ATOMFAIR®

What is the RF power rating and control interface of the Atomfair PV-1200-22 PECVD system?

The system is rated at 150 W RF. The RF source is integrated with a touch-screen control interface, which also manages the vacuum unit, gas supply system, automatic propulsion, and heating furnace configuration. This integrated control architecture is specific to the intelligent PECVD configuration of the PV-1200-22 model.

Which process layout configurations are available for the Atomfair PV-1200-22 PECVD system?

The PV-1200-22 PECVD system can be configured with rotational, sliding, double-zone, three-zone, compact, or preheating-assisted process layouts. The specific heating-zone arrangement, tube size, gas-flow channels, and vacuum pump package must be confirmed before quotation to ensure the configuration matches the intended deposition application.

What are the primary application areas for the Atomfair PV-1200-22 small intelligent PECVD system?

The system is designed for thin-film deposition, two-dimensional material growth, semiconductor-material preparation, and atmosphere-controlled laboratory process development. It is a plasma-enhanced chemical vapor deposition (PECVD) system intended for R&D workflows requiring controlled-atmosphere materials processing.

Assessment

This compact PECVD system integrates RF plasma, gas handling, vacuum, and heating modules with touch-screen control, suitable for thin-film deposition and 2D material growth in R&D labs. However, its small footprint and required pre-quotation configuration of tube size, gas flows, and vacuum package mean it is best suited for well-defined, small-scale processes.

Positive

Integrated Modular Configuration: Includes vacuum unit, gas supply system, RF source, automatic propulsion, and heating furnace in a single system, simplifying laboratory setup.
Intelligent Touch-Screen Control: Provides integrated process control via a touch-screen interface, enabling automated operation of the PECVD process.

Trade-offs

Pre-Order Configuration Confirmation Required: Critical parameters such as tube size, heating-zone layout, gas-flow channels, vacuum pump package, RF source, and power supply must be confirmed before quotation, indicating non-standard or user-dependent customization.
Small System Footprint Limitation: The product is designated as a 'Small Intelligent PECVD System', which implies a limited chamber size that may constrain substrate dimensions and throughput for larger-scale applications.

Quality Standards & Performance Verification

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Shipping & Returns

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).