Indium Shot Evaporation Material 99.99% 1-3 mm ATOMFAIR®

This indium evaporation material requires thermal/resistive evaporation or low-power e-beam deposition using a Mo/W/Ta boat or graphite/alumina crucible. The shot form (1-3 mm) must be compatible with the evaporation source geometry to ensure proper loading and film uniformity.

• Evaporation Source Material Compatibility: Use only molybdenum, tungsten, tantalum, or graphite/alumina crucibles to avoid contamination of the indium film.
• Vacuum Environment Requirement: Deposition must be performed under high vacuum to achieve proper thin-film formation and prevent oxidation.
• Melting Point Consideration: The melting point of 157°C determines the power setting required for thermal evaporation.
• Z-Ratio Calibration: The Z-ratio of 0.841 must be entered into the quartz crystal monitor for accurate thickness control.
• Shot Size Uniformity: Ensure the 1-3 mm shot is loaded uniformly into the source to prevent spitting and uneven evaporation.

This procedure describes the loading and evaporation of indium shot for vacuum deposition. Follow these steps to achieve consistent film quality.

Required Equipment: Evaporation Source (Mo/W/Ta boat or graphite/alumina crucible), Vacuum Deposition Chamber, Quartz Crystal Monitor, Power Supply for Thermal Evaporation

1. Inspect Indium Shot
   Inspect the indium shot for uniform size, absence of oxide layer, and proper packaging integrity.
2. Load Evaporation Source
   Load the indium shot into the pre-cleaned Mo/W/Ta boat or graphite/alumina crucible, distributing evenly across the source surface.
3. Evacuate Chamber
   Evacuate the deposition chamber to the required vacuum level for thin-film deposition.
4. Heat Source Gradually
   Apply power to the source gradually to reach the melting point of 157°C while monitoring the deposition rate.
5. Adjust Evaporation Rate
   Adjust the power input to achieve the desired evaporation rate, accounting for the Z-ratio of 0.841 for accurate thickness monitoring.

This Indium evaporation material (99.99% purity, shot 1-3 mm) is suited for thermal resistive evaporation with Mo/W/Ta boat or graphite/alumina crucible, requiring careful source matching and documentation review before ordering.

Positive

• High purity and defined form: 99.99% purity and shot 1-3 mm size ensure consistent source loading and deposition behavior for thin-film workflows.
• Flexible evaporation method compatibility: Thermal/resistive evaporation preferred with low-power e-beam optional; compatible with Mo/W/Ta boats or graphite/alumina crucibles for broad hardware integration.

Trade-offs

• Pre-purchase compatibility verification required: Buyers must confirm deposition source geometry, required quantity, and certificate requirements before quotation to avoid hardware mismatch.
• Documentation and handling prerequisites: Certificate, safety data sheet, shipment conditions, and export requirements must be reviewed against laboratory use protocols, adding administrative overhead.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).