Hafnium Nitride HfN Evaporation Pieces 99.9% ATOMFAIR®

Price range: $200.00 through $1,350.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

99.9% HfN evaporation pieces, 1-3 mm, for E-beam thin-film deposition and source loading; 25g-1kg packs with 3,305°C melting point. Order now.

Hafnium Nitride (HfN) Evaporation Material, Pieces, 99.9%, 1-3 mm
Product Type: Compound Evaporation Material
Research-grade laboratory product
Product Overview

Hafnium Nitride (HfN) Evaporation Material, Pieces, 99.9%, 1-3 mm is a research-grade compound evaporation material supplied as Pieces with 99.9% material specification and Pieces 1-3 mm size range for vacuum thin-film deposition workflows.

This evaporation material is prepared for laboratory procurement where material identity, purity, physical form, pack size and deposition hardware must be confirmed before ordering. The listed configuration supports selection for E-beam evaporation preferred; RFQ for thermal feasibility using E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | -.

Available pack sizes are 25g / 100g / 500g / 1kg. Buyers should confirm deposition source geometry, required quantity, certificate requirements and shipment conditions before quotation.

Performance Features
  • Defined material identity: Hafnium Nitride (HfN) for clear procurement and deposition-process matching.
  • Specified physical form: Pieces with Pieces 1-3 mm sizing to support source loading and evaporation review.
  • Purity or composition listed as 99.9%, allowing comparison between standard, high-purity and RFQ-controlled grades.
Technical Specifications
Parameter Specification / Available Values
Atomfair Model AF-HFNPCS-3N13MM
Material Hafnium Nitride
Formula HfN
Product Type Compound Evaporation Material
Form Pieces
Purity / Composition 99.9%
Particle Size / Dimensions Pieces 1-3 mm
Minimum Order Quantity 25g
Available Pack Sizes 25g / 100g / 500g / 1kg
Indicative Price Tiers 25g: USD 200; 100g: USD 400; 500g: USD 1050; 1kg: USD 1350
Evaporation Source E-beam hearth with compatible liner; high-temperature crucible by RFQ | Sheet2 hardware: – | – | – | – | –
Evaporation Method E-beam evaporation preferred; RFQ for thermal feasibility
Melting Point 3,305
Density 13.8
Z-Ratio **1.00
PROCUREMENT CHECK: Confirm model, purity, form, size range, pack size and deposition-source compatibility before quotation.
DOCUMENTATION REVIEW: Certificate, safety data sheet, shipment condition and export requirements can be reviewed against laboratory use requirements.
APPLICATION MATCHING: Evaporation source hardware and process route should be matched to material behavior, melting point and film requirements.
INQUIRY NOTE: Include the required model, purity, form, size range and quantity when requesting quotation support.
LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

Hafnium Nitride (HfN) evaporation material requires e-beam evaporation with a compatible liner or thermal evaporation using a high-temperature crucible confirmed via RFQ. The material's melting point of 3,305°C and density of 13.8 g/cm³ demand matching of deposition source hardware to avoid incomplete evaporation and ensure film quality.

  • Deposition Source Compatibility: Use an e-beam hearth with a compatible liner; thermal evaporation requires a high-temperature crucible confirmed via RFQ.
  • Process Matching: Match the evaporation source hardware and process route to the material's melting point (3,305°C) and density (13.8 g/cm³) to achieve desired film properties.
  • Film Thickness Monitoring: Calibrate the quartz crystal monitor using the provided Z-ratio of 1.00 for accurate film thickness measurement.
  • Pre-Deposition Verification: Confirm the material identity, purity (99.9%), form (pieces), and size range (1-3 mm) before loading into the evaporation source.
  • Documentation and Safety Review: Review the certificate of analysis, safety data sheet, and shipment conditions for handling precautions and storage requirements.

What is the significance of the Z-Ratio of 1.00 for Hafnium Nitride evaporation material in thin-film deposition?

A Z-Ratio of 1.00 indicates that the acoustic impedance of Hafnium Nitride matches the reference quartz crystal used in quartz crystal microbalance (QCM) thickness monitors, simplifying real-time deposition rate control. This value is explicitly listed in the technical specifications for the AF-HFNPCS-3N13MM material, ensuring straightforward calibration for E-beam evaporation processes.

Can Hafnium Nitride evaporation material be used with thermal evaporation instead of E-beam?

E-beam evaporation is the preferred method for this material; thermal evaporation is not standard and feasibility requires a request for quotation (RFQ). The product description specifies E-beam hearth with a compatible liner as the recommended evaporation source, and a high-temperature crucible by RFQ for thermal attempts.

What crucible material is required for evaporating Hafnium Nitride given its melting point of 3305°C?

Due to the high melting point of 3305°C, a high-temperature crucible is required, with specific material selection determined by RFQ. The standard configuration uses an E-beam hearth with a compatible liner, and buyers should confirm crucible compatibility with their deposition source geometry before ordering.

Hafnium Nitride (HfN) evaporation material in pieces (99.9% purity, 1–3 mm size) is suited for e-beam evaporation with a compatible liner, offering high melting point (3,305 °C) and density (13.8 g/cm³) for stable film deposition. Procurement requires confirmation of deposition-source hardware and thermal feasibility via RFQ for non-e-beam methods.

Positive

  • High melting point and density: Melting point of 3,305 °C and density of 13.8 g/cm³ support stable evaporation under e-beam, enabling reproducible deposition of hard, refractory HfN films.
  • Defined purity and particle size: 99.9% purity and 1–3 mm piece size provide consistent source loading and predictable evaporation behavior, critical for research-grade thin-film applications.

Trade-offs

  • E-beam evaporation preference: Material is preferred for e-beam evaporation; thermal evaporation feasibility requires RFQ, limiting immediate deployment to labs with e-beam hearths and compatible liners.
  • Hardware compatibility constraints: Deposition source must be matched to material behavior, including use of high-temperature crucible by RFQ, adding procurement and integration steps before use.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

25g, 100g, 500g, 1kg

Related Products