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Hafnium (Hf) Evaporation Material, Pieces, 99.9%, 1-3 mm
Product Type: Pure Metal Evaporation Material
Research-grade laboratory product
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LABORATORY PROCUREMENT SUPPORT
For material selection, deposition-source matching, pack-size confirmation or quotation support, contact our technical sales team.
INQUIRY: inquiry@atomfair.com
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Manufacturer: Atomfair LLC
Brand: ATOMFAIR®
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This material is intended for e-beam evaporation in high-vacuum thin-film deposition systems. Proper source compatibility and process parameter matching are required to achieve consistent film quality.
- Evaporation Source Compatibility: The material must be used with a water-cooled copper e-beam hearth and a compatible liner such as graphite, Al2O3, BN, or Ta.
- Key Process Parameters: The melting point of 2,227°C, density of 13.31 g/cm³, and Z-ratio of 0.36 must be incorporated into deposition rate monitoring and power control settings.
How does the 99.9% purity of this hafnium evaporation material influence its suitability for thin-film deposition?
The 99.9% purity ensures minimal metallic contamination in deposited films, which is critical for semiconductor and optical coating applications. The product description lists this as a standard grade, allowing comparison with higher-purity or RFQ-controlled grades for more demanding processes. The specified purity, combined with the defined form and size, supports consistent evaporation behavior.
What crucible or liner materials are compatible with E-beam evaporation of hafnium pieces?
The product description specifies that a water-cooled copper e-beam hearth is preferred, with compatible liners including graphite, Al2O3, BN, or Ta. These materials are chosen to withstand hafnium's high melting point (2,227 °C) and avoid chemical reaction. The selection depends on the specific deposition system and desired film purity.
What is the melting point of this hafnium evaporation material, and what does it imply for deposition system requirements?
The melting point of hafnium is 2,227 °C (as stated in the technical specifications). This requires a high-temperature E-beam evaporation source, and the product recommends using a water-cooled copper hearth with compatible liners (graphite, Al2O3, BN, Ta) to manage thermal stress. The Z-ratio of 0.36 should also be used for QCM calibration to ensure accurate film thickness monitoring.
This hafnium evaporation material offers 99.9% purity in 1-3 mm pieces, optimized for e-beam evaporation using water-cooled copper hearths. Its high melting point and Z-Ratio require careful process parameter matching and calibration.
Positive
- High-purity hafnium pieces: 99.9% purity and defined 1-3 mm piece size enable precise deposition matching and consistent source loading in e-beam evaporation systems.
- Preferred e-beam evaporation compatibility: Material is optimized for water-cooled copper e-beam hearths with compatible liners (graphite/Al2O3/BN/Ta), aligning with standard thin-film deposition hardware.
Trade-offs
- High melting point constraint: Melting point of 2,227°C requires high-energy e-beam evaporation, limiting compatibility with lower-power thermal evaporation systems.
- Z-Ratio calibration required: Z-Ratio of 0.36 deviates from unity, necessitating rate sensor calibration for accurate film thickness monitoring during deposition.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
