Atomfair Cerium Oxide Polishing Dispersion, 30 nm, 20% Solid Content, Water-Based
Product Description
Atomfair cerium oxide polishing dispersion is supplied as pale yellow emulsion with a particle size of 30 nm, 20% solid content, water as the listed solvent. It is intended for precision polishing.
|
Technical Specifications
|
||||||||||||||
|
Customization & Ordering
Custom specifications, quantities, and packaging may be available upon request. Submit the required specification and delivery timeline through Request a Quote.
Key Features and Advantages
- Particle size: 30 nm
- Solid Content: 20%
- Solvent: Water
APPLICATION SCOPE: precision polishing.
DOCUMENTATION: COA and SDS can be provided upon request for batch-specific confirmation.
LABORATORY PROCUREMENT SUPPORT
For grade selection, particle-size confirmation, documentation support or custom specification review, contact our technical sales team.
This water-based dispersion contains 30 nm cerium oxide particles at 20% solid content and requires controlled storage to prevent sedimentation or agglomeration. The pale yellow emulsion must be kept sealed and at stable temperatures to maintain colloidal stability and avoid contamination.
- Storage Stability: Store the dispersion in a sealed container at room temperature away from freezing or excessive heat to prevent particle settling or irreversible aggregation.
- Handling Precautions: Avoid exposure to air for extended periods to minimize solvent evaporation and maintain the specified 20% solid content.
This 30 nm cerium oxide dispersion is designed for precision polishing of surfaces such as glass or silicon wafers. Proper preparation and application ensure consistent material removal and surface finish.
Required Equipment: Polishing pad (e.g., polyurethane or felt), Dispensing container or pipette
- Prepare the polishing surface
Clean the substrate thoroughly to remove any debris or residues that could cause scratches during polishing. - Dispense the dispersion
Apply a uniform layer of the cerium oxide dispersion onto the polishing pad using a pipette or dispensing container. - Perform polishing
Move the substrate against the pad with consistent pressure and speed to achieve the desired material removal rate. - Rinse the substrate
Wash the polished surface with deionized water to remove residual slurry and prevent drying of particles.
What particle size and solid content specifications are available for this cerium oxide polishing dispersion?
The dispersion is supplied with a particle size of 30 nm and a solid content of 20%, with water as the solvent. It appears as a pale yellow emulsion and is intended for precision polishing.
Can the particle size, solid content, or packaging of this cerium oxide dispersion be customized?
Yes, custom specifications, quantities, and packaging may be available upon request. Submit the required specification and delivery timeline through the Request a Quote option to have the technical sales team review your needs.
What documentation is provided with this cerium oxide dispersion for batch verification?
COA and SDS can be provided upon request for batch-specific confirmation. For grade selection, particle-size confirmation, or documentation support, contact the technical sales team at inquiry@atomfair.com.
Atomfair Cerium Oxide Polishing Dispersion (30 nm, 20% solid, water-based) is evaluated for precision polishing applications. The 30 nm particle size provides a balance of removal rate and surface finish, while the water-based solvent simplifies lab integration.
Positive
- 30 nm Particle Size: The 30 nm particle size is optimized for precision polishing, enabling fine surface finishing with controlled material removal.
- Water-Based Solvent: Water-based formulation reduces environmental and safety concerns compared to organic solvent-based dispersions, simplifying handling and disposal in laboratory settings.
Trade-offs
- Solid Content Requires Process Adjustment: At 20% solid content, larger volumes or multiple passes may be needed for high-removal-rate polishing, increasing processing time relative to higher-concentration slurries.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
