Three-Zone PECVD Lab System 1200 °C 500 W RF ATOMFAIR®

$42,000.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Three-zone intelligent PECVD system with 1200 °C temperature class, 500 W RF source, vacuum and gas modules for thin-film deposition and 2D material growth.

SKU: AF-PV-P-1200-1XEF-0024
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Three-Zone Intelligent PECVD System, 1200 °C, 500 W RF
PLASMA-ENHANCED DEPOSITION EQUIPMENT
Product Overview

Three-Zone Intelligent PECVD System, 1200 °C, 500 W RF is configured for chemical vapor deposition and controlled-atmosphere materials processing in laboratory R&D workflows.

The product identity is distinguished by its 1200 °C temperature class and process configuration.

Confirm the usable tube size, heating-zone layout, gas-flow range, vacuum package, RF power where applicable and power supply before quotation.

Technical Specifications
Parameter Specification / Available Values
Atomfair Model PV-1200-24
Product Family Three zones intelligent PECVD system
Temperature Class 1200 °C
RF Source 500 W RF source class
Integrated Modules Vacuum unit, gas supply system, RF source, automatic propulsion and heating furnace configuration.
Control Interface Touch-screen integrated control is indicated for intelligent PECVD configurations.
Configuration Highlights
  • Latest PECVD brochure reviewed for row-level product identity.
  • PECVD configurations are distinguished by rotational, sliding, double-zone, three-zone, compact or preheating-assisted process layout.
  • RF source class and intelligent control notes are shown only as quotation-critical configuration points.
APPLICATION SCOPE: Thin-film deposition, two-dimensional material growth, semiconductor-material preparation and atmosphere-controlled laboratory process development.
PACKAGING: The equipment is prepared with protective inner materials and reinforced outer packaging for handling, storage and delivery.
IMPORTANT NOTICE: Please confirm tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source where applicable, power supply and required accessories before quotation.
LABORATORY PROCUREMENT SUPPORT
For model selection, configuration matching, power supply confirmation or quotation review, contact our technical sales team.
E-MAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

The Atomfair PV-1200-24 PECVD system operates at a maximum temperature of 1200°C with a 500 W RF source. It requires a vacuum pump package, gas supply system, and proper configuration of tube size and heating zones for safe operation.

  • Maximum Operating Temperature: Do not exceed the rated temperature class of 1200°C.
  • RF Power Limit: The RF source is rated at 500 W; do not operate above this power.
  • Gas and Vacuum Compatibility: Use only with the specified vacuum pump package and gas supply system.
  • Configuration Verification: Confirm tube size, heating-zone arrangement, gas-flow channels, and accessories before installation.
  • Storage and Transport: The equipment requires protective inner materials and reinforced outer packaging for handling and storage.

What is the maximum operating temperature and RF power rating of the Atomfair PV-1200-24 three-zone PECVD system?

The system is rated for a 1200 °C temperature class and includes a 500 W RF source class. These values define the thermal and plasma-generation envelope for deposition processes, but the exact tube size, heating-zone layout, and gas-flow configuration must be confirmed with the supplier before quotation, as they are not fixed in the base specification.

Does the PV-1200-24 PECVD system include integrated vacuum and gas delivery modules, or are these purchased separately?

The product description lists 'Integrated Modules' as including vacuum unit, gas supply system, RF source, automatic propulsion, and heating furnace configuration, indicating these are part of the system's integrated design. However, the exact configuration of these modules is not specified in the source, so you must confirm the vacuum pump package, gas-flow channels, and RF source details with the supplier before ordering.

What are the key configuration options for the Atomfair PV-1200-24 PECVD system, and how do they affect deposition capability?

The system is distinguished by its rotational, sliding, double-zone, three-zone, compact, or preheating-assisted process layout, as noted in the configuration highlights. These options determine the deposition uniformity and process flexibility, but the specific configuration for your application must be confirmed with the technical sales team before quotation.

Three-zone intelligent PECVD system with 1200°C operating temperature and 500 W RF source, integrating vacuum, gas, and automatic propulsion modules for controlled thin-film deposition and semiconductor material processing in R&D environments.

Positive

  • High-temperature plasma-enhanced deposition: 1200°C temperature class combined with 500 W RF source enables plasma-enhanced chemical vapor deposition and processing of materials requiring elevated thermal budgets, such as two-dimensional materials and semiconductor thin films.
  • Integrated multi-module configuration: Vacuum unit, gas supply system, RF source, automatic propulsion, and heating furnace are integrated into a single system, reducing external component sourcing and simplifying setup for atmosphere-controlled process development.

Trade-offs

  • Pre-quotation configuration required: Tube size, heating-zone arrangement, gas-flow channels, vacuum pump package, RF source, power supply, and accessories must be individually confirmed before quotation, indicating a non-standardized build that requires detailed specification review.
  • Operational complexity and infrastructure demands: Integration of RF, vacuum, gas, and automated propulsion modules requires laboratory expertise in PECVD operation and appropriate facility infrastructure (gas handling, exhaust, cooling, electrical supply) to achieve reliable thin-film deposition.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

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