Description
This Nickel Silicon (NiSi) alloy sputtering target offers high purity (99.9%) with a precise composition of 97% nickel and 3% silicon by weight. Ideal for thin film deposition applications in semiconductor and coating industries. The target comes in a standard disc shape with excellent uniformity.
| Material | Composition | Purity | Dimensions | Form | Packaging |
|---|---|---|---|---|---|
| Nickel Silicon Alloy | Ni/Si = 97/3 wt% | 99.9% (4N) | φ80 × 6mm | Disc | 1 piece per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
