Atomfair High-Purity Nickel Chromium Aluminum Yttrium Alloy Sputtering Target (NiCrAlY, 99.5%)

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

This NiCrAlY alloy sputtering target offers high-purity (99.5%) with precise composition control (Ni/Cr/Al/Y = 67/22/10/1 at%). Ideal for thin film deposition in research and industrial applications. The target comes in disc form with standard dimensions.

SKU: AFMSGDWO795
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Description

This NiCrAlY alloy sputtering target offers high-purity (99.5%) with precise composition control (Ni/Cr/Al/Y = 67/22/10/1 at%). Ideal for thin film deposition in research and industrial applications. The target comes in disc form with standard dimensions.

Product Name Composition (at%) Purity Dimensions Form Packaging
Nickel Chromium Aluminum Yttrium Alloy Target Ni/Cr/Al/Y = 67/22/10/1 99.5% φ60 × 3mm Disc 1 piece per pack

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Disclaimer: Sold exclusively for laboratory research.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

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