β-Silicon Carbide Powder D50 13μm 3C-SiC ATOMFAIR®

Price range: $169.00 through $549.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

β-Silicon carbide (3C-SiC) abrasive powder with D50 13.0±1.2 μm, D10 8.35±0.35 μm, D97 ≤23 μm and tap density 1.72±0.05 g/cm3.

SKU: AF-FM-C-SICW-013W-SP00
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Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC), D50 13.0 ± 1.2 μm


Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC), D50 13.0 ± 1.2 μm

Product Description

Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC) is supplied with a D50 13.0 ± 1.2 μm particle-size specification and high natural bulk density. It is intended for precision grinding, lapping, polishing, and abrasive-processing research.

Technical Specifications
Parameter Specification / Available Values
Product Beta Silicon Carbide Fine Abrasive Powder (3C-SiC)
Material Silicon carbide
Chemical Formula SiC
Crystal Phase / Structure Cubic beta-SiC (3C-SiC)
Basic Grain Content 60%-80%
D10 8.35±0.35 μm
D50 (Median Particle Size) 13.0±1.2 μm
D90 18.4±2.6 μm
D97 ≤23 μm
Tap Density 1.72 ± 0.05 g/cm³ (tap)

Customization & Ordering

Custom particle-size and purity requirements may be evaluated for selected
grades upon request. Alternative package sizes may also be available.
Minimum order quantities, pricing, and lead times vary by specification and
will be confirmed during technical review and quotation.

Key Features and Advantages

  • Defined D50 13.0 ± 1.2 μm particle-size grade.
  • High natural bulk density and efficient abrasive-cutting behavior.
  • Lower processed-surface roughness and improved surface-finish performance.
  • Suitable for controlled grinding, lapping, and polishing evaluation.

APPLICATION SCOPE: precision grinding, lapping, polishing, and abrasive-processing research

DOCUMENTATION: COA and SDS can be provided upon request for batch-specific confirmation. Additional documentation requirements may be discussed before order confirmation.

LABORATORY PROCUREMENT SUPPORT

For grade selection, particle-size confirmation, documentation support or custom specification review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com


How does the D50 13.0 μm particle size distribution affect surface finish and removal rate?

The D50 13.0 ± 1.2 μm particle size, with D10 8.35±0.35 μm and D90 18.4±2.6 μm, provides a balance between cutting efficiency and surface quality. The product is described as achieving lower processed-surface roughness, making it suitable for precision grinding and polishing.

What is the significance of the tap density of 1.72 g/cm³ for this abrasive powder?

The tap density of 1.72 ± 0.05 g/cm³ indicates a high natural bulk density, which contributes to efficient abrasive-cutting behavior and consistent slurry properties in lapping and polishing applications. This parameter is critical for process control and packing density.

What documentation is available for quality assurance of this Beta Silicon Carbide powder?

A Certificate of Analysis (COA) and Safety Data Sheet (SDS) can be provided upon request for batch-specific confirmation. The product description also notes that additional documentation requirements may be discussed before order confirmation, supporting traceability in research and industrial applications.

Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC) with D50 13.0±1.2 μm offers high tap density (1.72 g/cm³) and tight particle size distribution, suitable for precision grinding and lapping research, though basic grain content variability (60-80%) and reliance on batch-specific documentation for quality assurance are operational considerations.

Positive

  • Tight median particle size tolerance: D50 specified as 13.0±1.2 μm with additional D10, D90, and D97 constraints ensures consistent abrasive performance for controlled material removal.
  • High tap density for efficient cutting: Tap density of 1.72±0.05 g/cm³ contributes to efficient abrasive-cutting behavior and reduced surface roughness during lapping and polishing.

Trade-offs

  • Variable basic grain content: Basic grain content is specified as 60-80%, indicating potential variability in purity or grain composition that may affect reproducibility in sensitive applications.
  • Documentation only upon request: COA and SDS are provided upon request rather than automatically, requiring proactive procurement steps for batch-specific quality verification.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

1kg, 5kg

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