Beta Silicon Carbide 3C-SiC Powder D50 4.5μm ATOMFAIR®

Price range: $169.00 through $549.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

3C-SiC beta silicon carbide abrasive powder with D50 4.5 ± 0.5 μm, D97 ≤8.5 μm and 1.63 ± 0.05 g/cm3 tap density. Order now.

SKU: AF-FM-C-SICW-0041-SP00
Category:
Brands:






Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC), D50 4.5 ± 0.5 μm


Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC), D50 4.5 ± 0.5 μm

Product Description

Atomfair Beta Silicon Carbide Fine Abrasive Powder (3C-SiC) is supplied with a D50 4.5 ± 0.5 μm particle-size specification and high natural bulk density. It is intended for precision grinding, lapping, polishing, and abrasive-processing research.

Technical Specifications
Parameter Specification / Available Values
Product Beta Silicon Carbide Fine Abrasive Powder (3C-SiC)
Material Silicon carbide
Chemical Formula SiC
Crystal Phase / Structure Cubic beta-SiC (3C-SiC)
Basic Grain Content 60%-80%
D10 2.8±0.4 μm
D50 (Median Particle Size) 4.5±0.5 μm
D90 7.15±0.45 μm
D97 ≤8.5 μm
Tap Density 1.63 ± 0.05 g/cm³ (tap)

Customization & Ordering

Custom particle-size and purity requirements may be evaluated for selected
grades upon request. Alternative package sizes may also be available.
Minimum order quantities, pricing, and lead times vary by specification and
will be confirmed during technical review and quotation.

Key Features and Advantages

  • Defined D50 4.5 ± 0.5 μm particle-size grade.
  • High natural bulk density and efficient abrasive-cutting behavior.
  • Lower processed-surface roughness and improved surface-finish performance.
  • Suitable for controlled grinding, lapping, and polishing evaluation.

APPLICATION SCOPE: precision grinding, lapping, polishing, and abrasive-processing research

DOCUMENTATION: COA and SDS can be provided upon request for batch-specific confirmation. Additional documentation requirements may be discussed before order confirmation.

LABORATORY PROCUREMENT SUPPORT

For grade selection, particle-size confirmation, documentation support or custom specification review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com


How does the particle size distribution (D50 4.5 ± 0.5 μm) of this beta SiC powder affect the achievable surface roughness in precision lapping?

The narrow D50 tolerance of ±0.5 μm, combined with D90 of 7.15 ± 0.45 μm and D97 ≤ 8.5 μm, ensures a tight particle size distribution. This uniformity translates to consistent cutting depth across the abrasive, reducing surface defects and enabling predictable, low-roughness finishes in lapping applications. The median particle size of 4.5 μm is suited for intermediate to fine lapping steps.

What does the 60%–80% basic grain content indicate about the quality of this silicon carbide abrasive?

Basic grain content refers to the proportion of monocrystalline particles versus polycrystalline or agglomerated ones. A 60%–80% range indicates a high fraction of sharp, single-crystal cutting edges, which improves material removal efficiency and reduces sub-surface damage compared to lower-basic-grain abrasives. This specification is key for achieving consistent scratch patterns and surface integrity in precision grinding and polishing.

How does the tap density of 1.63 g/cm³ affect slurry preparation and abrasive performance?

The tap density of 1.63 ± 0.05 g/cm³ reflects efficient particle packing behavior. In slurry, this high density reduces sedimentation rate, maintaining a stable particle concentration during polishing or lapping. This leads to more predictable material removal rates and consistent surface finish over extended processing times.

This graded 3C-SiC abrasive powder is specified with a D50 of 4.5 ± 0.5 μm, a documented D10/D50/D90/D97 distribution, and a tap density of 1.63 ± 0.05 g/cm³, making it suitable for controlled grinding, lapping, and polishing evaluation. The cubic beta-SiC phase and defined fine-grade sizing support reproducible abrasive behavior, while the 60%–80% basic grain content and ≤8.5 μm D97 require users to verify PSD tolerance for finish-critical processes.

Positive

  • Defined fine-grade particle-size distribution: The full D10/D50/D90/D97 specification with a D50 of 4.5 ± 0.5 μm gives users a quantified median and coarse-tail bound for reproducible grinding, lapping, and polishing trials.
  • High bulk density for stable abrasive delivery: The documented tap density of 1.63 ± 0.05 g/cm³ and stated high natural bulk density support dense packing and efficient cutting behavior in abrasive-processing research.

Trade-offs

  • Broad basic grain content tolerance: Basic grain content is specified as only 60%–80%, meaning a substantial portion may fall outside the main grain band; batch PSD verification is advised for precision finish work.
  • Coarse tail up to 8.5 μm: D97 is specified at ≤8.5 μm, so oversized outliers in the distribution can stress finish-sensitive processes even though the median size is 4.5 μm.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package

1kg, 5kg

Related Products