Silicon Dioxide Polishing Dispersion 100nm ATOMFAIR®

Price range: $159.00 through $599.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Water-based silicon dioxide polishing dispersion with 100 nm particles, 30% solid content, and white emulsion appearance for precision polishing. Order now.

SKU: AF-FM-C-SIO2-100W-SP00
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Atomfair Silicon Dioxide Polishing Dispersion, 100 nm, 30% Solid Content, Water-Based



Atomfair Silicon Dioxide Polishing Dispersion, 100 nm, 30% Solid Content, Water-Based

Product Description

Atomfair silicon dioxide polishing dispersion is supplied as white emulsion with a particle size of 100 nm, 30% solid content, water as the listed solvent. It is intended for precision polishing.

Technical Specifications
Parameter Specification / Available Values
Product Silicon Dioxide Polishing Dispersion
Material Silicon Dioxide
Solid Content 30%
Appearance white emulsion
Particle Size 100 nm
Solvent Water

Customization & Ordering

Custom specifications, quantities, and packaging may be available upon request. Submit the required specification and delivery timeline through Request a Quote.

Key Features and Advantages

  • Particle size: 100 nm
  • Solid Content: 30%
  • Solvent: Water

APPLICATION SCOPE: precision polishing.

DOCUMENTATION: COA and SDS can be provided upon request for batch-specific confirmation.

LABORATORY PROCUREMENT SUPPORT

For grade selection, particle-size confirmation, documentation support or custom specification review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com



What role does the 100 nm particle size play in the polishing performance of this silicon dioxide dispersion?

The 100 nm particle size is specified for precision polishing, enabling fine surface finishing with minimal surface damage. The dispersion also contains 30% solid content in a water-based formulation, providing a concentrated yet manageable polishing medium suitable for controlled dilution.

Can this water-based silicon dioxide dispersion be used for semiconductor wafer or optical component polishing?

This dispersion is intended for precision polishing, with water as the solvent and 100 nm silica particles. While specific substrate compatibility is not listed, the product is suitable for precision polishing applications; for grade selection and compatibility confirmation, contact the technical sales team.

What documentation and customization options are available for this silicon dioxide polishing dispersion?

COA (Certificate of Analysis) and SDS (Safety Data Sheet) can be provided upon request for batch-specific confirmation. Custom specifications, quantities, and packaging are available upon request, and the technical sales team can assist with grade selection and custom specification review.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package Size

100g, 250g, 500g, 1kg

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