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Atomfair High Purity Manganese Cobalt Nickel Alloy Sputtering Target (MnCoNi, 99.5%)
This high-purity Manganese Cobalt Nickel (MnCoNi) alloy sputtering target is ideal for thin film deposition applications. With a composition of Mn1.56 Co0.96 Ni0.48 at% and 99.5% purity, it ensures consistent performance in research and industrial processes. The target is precision-manufactured to meet strict quality standards.
Description
This high-purity Manganese Cobalt Nickel (MnCoNi) alloy sputtering target is ideal for thin film deposition applications. With a composition of Mn1.56 Co0.96 Ni0.48 at% and 99.5% purity, it ensures consistent performance in research and industrial processes. The target is precision-manufactured to meet strict quality standards.
| Product Name | Composition | Purity | Dimensions | Packaging | Pack Size |
|---|---|---|---|---|---|
| Manganese Cobalt Nickel Alloy Target | Mn1.56 Co0.96 Ni0.48 at% | 99.5% | ฯ50 ร 4mm | Piece | 1 |
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Disclaimer: Sold exclusively for laboratory research.
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