Description
This Chromium Aluminum (CrAl) alloy sputtering target offers high purity (99.5%) with an 80:20 atomic ratio composition. Ideal for thin film deposition applications, it comes in a standard disc size of φ100×4mm and is produced via hot pressing for consistent quality.
| Product Name | Composition (at%) | Purity | Dimensions | Production Method | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Chromium Aluminum Alloy Target | Cr:Al = 80:20 | 99.5% | φ100×4mm | Hot Pressed | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
