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Showing 4673–4688 of 14661 results
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Atomfair High Purity Iron-Zirconium Alloy Lump (FeZr, Fe/Zr=1/1 wt%, 4N-5N Purity)
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Atomfair High Purity Lanthanum Fluoride (LaF3) Sputtering Target 99.9% (4N) for Thin Film Deposition
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Atomfair High Purity Lanthanum-Copper Alloy Lump (LaCu 4/96 wt%) – 4N Copper Base
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Atomfair High Purity Lithium Tantalate (LiTaO3) Sputtering Target 4N (99.9%) – Various Sizes with Optional Copper Backing
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Atomfair High Purity Manganese Cobalt Nickel Alloy Sputtering Target (MnCoNi, 99.5%)
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Atomfair High Purity Manganese-Aluminum Alloy Sputtering Target (AlMn 90/10 wt%, 99.5% purity)
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Atomfair High Purity Molybdenum Carbide (Mo2C) Sputtering Target 99.5%
