Zirconium Dioxide Polishing Dispersion 80 nm ATOMFAIR®

Price range: $269.00 through $1,499.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

Water-based zirconium dioxide polishing dispersion with 80 nm particles and 20% solid content, supplied as white emulsion for precision polishing. Order now.

SKU: AF-FM-C-SIO2-R80W-SP00
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Atomfair Zirconium Dioxide Polishing Dispersion, 80 nm, 20% Solid Content, Water-Based



Atomfair Zirconium Dioxide Polishing Dispersion, 80 nm, 20% Solid Content, Water-Based

Product Description

Atomfair zirconium dioxide polishing dispersion is supplied as white emulsion with a particle size of 80 nm, 20% solid content, water as the listed solvent. It is intended for precision polishing.

Technical Specifications
Parameter Specification / Available Values
Product Zirconium Dioxide Polishing Dispersion
Material Zirconium Dioxide
Solid Content 20%
Appearance white emulsion
Particle Size 80 nm
Solvent Water

Customization & Ordering

Custom specifications, quantities, and packaging may be available upon request. Submit the required specification and delivery timeline through Request a Quote.

Key Features and Advantages

  • Particle size: 80 nm
  • Solid Content: 20%
  • Solvent: Water

APPLICATION SCOPE: precision polishing.

DOCUMENTATION: COA and SDS can be provided upon request for batch-specific confirmation.

LABORATORY PROCUREMENT SUPPORT

For grade selection, particle-size confirmation, documentation support or custom specification review, contact our technical sales team.

E-MAIL: inquiry@atomfair.com



This 80 nm zirconium dioxide polishing dispersion with 20% solid content in a water-based carrier is evaluated for precision polishing applications, where its narrow particle size and stable emulsion provide controlled material removal rates, though the water-based solvent imposes constraints on substrate compatibility and drying protocols.

Positive

  • Controlled 80 nm particle size: The 80 nm particle size enables fine, uniform polishing with predictable surface finish, suitable for precision applications requiring minimal subsurface damage.
  • Water-based solvent system: Water as the carrier solvent reduces toxicity and flammability risks compared to organic solvent-based dispersions, simplifying handling and waste disposal in laboratory environments.

Trade-offs

  • Water-sensitive substrate limitation: The water-based formulation may cause corrosion or degradation on moisture-sensitive substrates, requiring compatibility testing before use on reactive metals or hygroscopic materials.
  • Drying and residue management: Water-based dispersions can leave residual moisture or require controlled drying conditions to prevent particle agglomeration or staining on polished surfaces, adding process steps.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Package Size

100g, 250g, 500g, 1kg

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