thin-film deposition
Showing 97–112 of 115 results
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Titanium-Chromium Alloy Sputtering Target (TiCr)
$3,865.00 -
Titanium-Cobalt Alloy Sputtering Target (TiCo (97:3 wt%))
$370.00 -
Titanium-Magnesium Alloy Sputtering Target (TiMg(65:35 at%))
$620.00 -
Titanium-Nickel Alloy Sputtering Target (TiNi (50:50 wt%))
$960.00 -
Titanium-Niobium Alloy Sputtering Target (TiNb)
$920.00 -
Titanium-Silicon Alloy Sputtering Target (TiSi)
$920.00 -
Titanium-Tantalum Alloy Sputtering Target (TiTa)
$510.00 -
Tungsten Alloy Sputtering Target (WRe (90/10 wt%))
$710.00 -
Tungsten-Chromium Alloy Sputtering Target (WCr)
$5,675.00 -
Tungsten-Lanthanum Alloy Sputtering Target (W-La)
$710.00 -
Tungsten-Molybdenum Alloy Sputtering Target (W/Mo (90:10))
$5,930.00 -
Tungsten-Nickel Alloy Sputtering Target (W/Ni (90:10))
$5,930.00 -
Tungsten-Tantalum Alloy Sputtering Target (WTa)
$10,165.00 -
Tungsten-Titanium Alloy Sputtering Target (WTi (90:10 wt%))
$5,675.00 -
Tungsten-Titanium Alloy Sputtering Target (WTi(90:10wt%))
$5,930.00 -
Vanadium-Aluminum Alloy Sputtering Target (VAl)
$765.00