Description
Atomfair Metallographic Polishing Pads
Product Overview
Atomfair Metallographic Polishing Pads are precision-engineered for coarse and fine polishing in material sample preparation. Featuring a high-strength premium polishing layer, these pads deliver outstanding performance, long service life, and consistent results. With universal compatibility, they fit most manual, semi-automatic, and fully automatic polishing machines to improve laboratory workflow efficiency.
Key Features & Benefits
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Universal Compatibility: Fits standard 8-inch (200 mm) polishing heads for manual and automated polishing systems.
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Secure PSA Backing: Pressure‑sensitive adhesive enables bubble‑free, firm mounting on polishing wheels with no slippage, reducing setup time.
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Application‑Optimized Materials: Full range of pad types for all sample preparation stages, from coarse material removal to final mirror finishing.
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Consistent & Durable: High-quality fabric ensures uniform polishing and extended service life, lowering replacement frequency.
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International Standard Compliance: Supports sample preparation in line with global standards including ASTM E3 and ISO 17781.
Material Selection Guide
Choosing the right pad material is critical for optimal surface finish and sample integrity. Select based on your sample material and preparation stage:
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Pad Material
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Pile Type
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Ideal Applications
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|---|---|---|
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Silk Velvet
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Long Pile
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Final/fine polishing of hard materials (steels, high‑precision alloys) and soft non‑ferrous metals (aluminum, copper, magnesium).
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Premium Silk Velvet
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Medium–Short Pile
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Versatile, durable polishing for steels, electronic circuit boards, and soft metals (copper, aluminum).
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Canvas
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No Pile
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Initial coarse polishing; removes significant surface deformation from steel samples.
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Silk Cloth
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No Pile
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Polishing of materials containing graphite or fragile inclusions (prevents pull‑out).
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Nylon
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No Pile
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Coarse polishing of steels and other ferrous alloys (synthetic fiber construction).
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Woolen Cloth
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Short Pile
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General polishing of steel materials (thickened navy wool).
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Synthetic Polymer Pad (Synthetic Leather)
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—
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Compatible with diamond, alumina (Al₂O₃), and colloidal silica suspensions. Ideal for final fine polishing of very soft materials (titanium, copper, silver) and mechanochemical polishing (CMP).
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Technical Specifications
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Product Type: PSA‑backed metallographic polishing pad
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Available Materials: Silk Velvet (Long Pile), Premium Silk Velvet (Medium–Short Pile), Silk Cloth (No Pile), Premium Silk Cloth (No Pile), Woolen Cloth (Short Pile), Canvas (No Pile), Nylon (No Pile)
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Diameter: 8 inches (200 mm)
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Backing: Pressure‑sensitive adhesive (PSA) for quick, secure, bubble‑free mounting
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Packaging: 10 pads per sealed bag
Usage Note
For best results, match the pad material with the recommended abrasive type and suspension according to your sample material and preparation stage.
For inquiries, questions, or custom requirements, please contact us at: inquiry@atomfair.com
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
