Description
Atomfair Metallographic Polishing Pads
Product Overview
Atomfair Metallographic Polishing Pads are precision-engineered for coarse and fine polishing in material sample preparation. Equipped with a premium high-strength polishing layer, these pads deliver exceptional performance, long-lasting durability, and consistent results across applications. Designed for universal compatibility, they seamlessly integrate with most manual, semi-automatic, and fully automatic polishing machines, optimizing laboratory workflow efficiency.
Key Features & Benefits
- Universal Compatibility: Fits standard 8-inch (200 mm) polishing heads on both manual and automated polishing systems.
- Secure PSA Backing: Pressure-Sensitive Adhesive (PSA) ensures bubble-free, firm mounting on polishing wheels?no slippage during operation, reducing setup time.
- Application-Optimized Materials: A comprehensive range of pad materials tailored to every stage of sample preparation, from coarse material removal to final mirror finishing.
- Consistent & Durable: Premium fabric construction guarantees uniform polishing action and extended service life, minimizing replacement frequency.
- International Standard Compliance: Supports sample preparation procedures aligned with global standards including ASTM E3 and ISO 17781.
Material Selection Guide
Choosing the right pad material is critical to achieving optimal surface finish and preserving sample integrity. Select based on your specific sample material and preparation stage:
| Pad Material | Pile Type | Ideal Applications |
|---|---|---|
| Silk Velvet | Long Pile | Final/fine polishing of hard materials (e.g., steels, high-precision alloys) and soft non-ferrous metals (aluminum, copper, magnesium). |
| Premium Silk Velvet | Medium-Short Pile | Versatile, durable option for polishing steels, electronic circuit boards, and soft metals (copper, aluminum). |
| Canvas | No Pile | Initial coarse polishing?removes significant surface deformation from steel samples. |
| Silk Cloth | No Pile | Polishing materials containing graphite or fragile inclusions (prevents pull-out). |
| Nylon | No Pile | Coarse polishing of steels and other ferrous alloys (synthetic fiber construction). |
| Woolen Cloth | Short Pile | General polishing of steel materials (made from thickened navy wool). |
| Synthetic Polymer Pad (Synthetic Leather) | – | Compatible with diamond, alumina (Al2O3), or colloidal silica suspensions. Ideal for final fine polishing of extremely soft materials (titanium, copper, silver) and mechano-chemical polishing (CMP) processes. |
Technical Specifications
- Product Type: PSA-Backed Metallographic Polishing Pad
- Available Materials: Silk Velvet (Long Pile), Premium Silk Velvet (Medium-Short Pile), Silk Cloth (No Pile), Premium Silk Cloth (No Pile), Wool Cloth (Short Pile), Canvas (No Pile), Nylon (No Pile)
- Diameter: 8 inches (200 mm)
- Backing: Pressure-Sensitive Adhesive (PSA) ? for quick, secure, bubble-free mounting
- Packaging: 10 pads per sealed bag
Usage Note
For optimal results, always match the pad material with the recommended abrasive type and suspension, based on your specific sample material and preparation stage.
If you?re interested, have any questions, or have specific customization requirements, please feel free to contact us at inquiry@atomfair.com.
