Atomfair 99.99% Pure Silica (SiO2) Sputtering Target Material – D50 x 3mm Specifications

$99.95

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

This 99.99% Pure Silica Sputtering Target Material is designed for high-performance applications in various industries, including semiconductor manufacturing, optics, and thin-film deposition. With exceptional purity and precise specifications, this target material ensures optimal results in sputtering processes.

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1 – 4 $99.95
5+ $89.95
SKU: BBSTSIO200B2A0
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Description

Atomfair 99.99% Pure Silica (SiO2) Sputtering Target Material – D50 x 3mm Specifications


Product Overview

This 99.99% Pure Silica Sputtering Target Material is designed for high-performance applications in various industries, including semiconductor manufacturing, optics, and thin-film deposition. With exceptional purity and precise specifications, this target material ensures optimal results in sputtering processes.

Key Features

  • High Purity: Made from 99.99% pure silica (SiO2), ensuring minimal contamination and superior film quality.
  • Precision Specifications: Dimensions of D50 x 3mm, ideal for a wide range of sputtering applications.
  • Versatile Application: Suitable for semiconductor, photovoltaic, and optical coating processes.
  • Excellent Performance: Provides consistent and reliable results for high-tech industries.

Technical Specifications

  • Material: Silica (SiO2)
  • Purity: 99.99%
  • Diameter: 50 mm (D50)
  • Thickness: 3 mm
  • Form: Sputtering target

Benefits

  • Enhanced Film Quality: This high purity level ensures that deposited films are of the highest quality, with fewer defects and better performance.
  • Reliability: Consistent material properties make this target suitable for production-scale operations.
  • Cost-Effective: High-quality sputtering targets reduce the need for rework and improve overall yield.

Applications

  • Semiconductor Devices: This target is used in the fabrication of transistors, capacitors, and integrated circuits.
  • Optical Coatings: Ideal for creating thin films for mirrors, lenses, and filters.
  • Solar Cells: Essential for thin-film photovoltaic applications.

Packaging and Shipping

This sputtering target is carefully packaged to prevent damage during transit. Fast and reliable shipping options are available.

Customer Support

This dedicated customer support team is available to assist with any inquiries or technical questions. If customers need sputtering targets with different purities or sizes, they can contact them via email for consultation and customization. This team strives to provide the best service and support for their needs.

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Additional information

Weight 0.3 kg
Dimensions 15 × 8 × 11 cm