Atomfair 99.99% Pure Aluminum Sputtering Target Material – D50 x 3mm Specifications
Product Overview
This 99.99% Pure Aluminum Sputtering Target Material is designed for high-performance applications in various industries, including semiconductor manufacturing, optics, and thin-film deposition. With exceptional purity and precise specifications, this target material ensures optimal results in your sputtering processes.
Key Features
- High Purity: Made from 99.99% pure aluminum, ensuring minimal contamination and superior film quality.
- Precision Specifications: Dimensions of D50 x 3mm, ideal for a wide range of sputtering applications.
- Versatile Application: Suitable for semiconductor, photovoltaic, and optical coating processes.
- Excellent Performance: Provides consistent and reliable results for high-tech industries.
Technical Specifications
- Material: Aluminum
- Purity: 99.99%
- Diameter: 50 mm (D50)
- Thickness: 3 mm
- Form: Sputtering target
Benefits
- Enhanced Film Quality: The high purity level ensures that your deposited films are of the highest quality, with fewer defects and better performance.
- Reliability: Consistent material properties make this target suitable for production-scale operations.
- Cost-Effective: High-quality sputtering targets reduce the need for rework and improve overall yield.
Applications
- Semiconductor Devices: Used in the fabrication of transistors, capacitors, and integrated circuits.
- Optical Coatings: Ideal for creating thin films for mirrors, lenses, and filters.
- Solar Cells: Essential for thin-film photovoltaic applications.
Packaging and Shipping
- Each sputtering target is carefully packaged to prevent damage during transit.
- Fast and reliable shipping options available.
Customer Support
Our dedicated customer support team is here to assist you with any inquiries or technical questions. If you need sputtering targets with different purities or sizes, feel free to contact us via email for consultation and customization. We strive to provide the best service and support for your needs.
How does the 99.99% purity of this aluminum sputtering target minimize contamination during thin-film deposition?
The 99.99% purity level ensures minimal introduction of impurities during sputtering, resulting in superior film quality with fewer defects. This high purity is critical for semiconductor and optical coating applications where even trace contaminants can degrade device performance, as stated in the product specifications.
What are the exact dimensions of this sputtering target and how do they fit standard sputtering systems?
The target has a diameter of 50 mm and a thickness of 3 mm (D50 x 3 mm). These dimensions are common for many standard sputtering guns, but users should verify compatibility with their specific system to ensure proper mounting and uniform deposition.
In which specific thin-film technology areas is this 99.99% aluminum sputtering target applied?
This aluminum target is used in semiconductor device fabrication (transistors, capacitors, integrated circuits), optical coatings (mirrors, lenses, filters), and thin-film photovoltaic solar cells. Its high purity and consistent material properties make it suitable for these production-scale deposition processes.
This 99.99% pure aluminum sputtering target (D50 x 3mm) provides high-purity material for demanding thin-film deposition in semiconductor, optical, and photovoltaic processes, with precisely specified dimensions for consistent sputtering. The fixed purity and geometry require compatibility verification with target holders, and careful handling is necessary due to potential transit damage.
Positive
- High purity ensures low contamination: The 99.99% purity level minimizes metallic and gaseous impurities in deposited films, reducing defect density and improving electrical and optical performance in semiconductor and coating applications.
- Precise dimensions for standard fit: The D50 x 3mm geometry is a common sputtering target size, allowing straightforward integration into many standard magnetron and ion-beam systems without custom machining.
Trade-offs
- Fragile and requires careful handling: The target is packaged to prevent damage during transit, indicating mechanical sensitivity; improper handling or mounting can cause cracking or warping, affecting sputtering uniformity.
- Fixed purity and dimensions: This unit is only supplied in 99.99% purity and D50 x 3mm; buyers needing alternative purities or sizes must request custom manufacturing, which may introduce lead time and minimum order constraints.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD excl. heavy equipment). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
