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Spin Coater AF-4A/5A Dual-Stage 8000 rpm Perovskite Thin Film Vacuum

Price range: $2,100.00 through $4,200.00

Institutional Procurement & Supply Compliance: As a verified US supplier, Atomfair accepts formal institutional Purchase Orders (POs), contract billing schedules, and custom procurement loops for university and national laboratories, and corporate R&D departments globally.

AF-4A/5A dual-stage spin coater 500-8000 rpm, ±1% speed stability. LED display, photoelectric pulse tachometer. Perovskite thin film spin coating, photoresist, ITO glass. Vacuum pump included.

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Description

SPIN COATER AF-4A/5A DUAL-STAGE 8000 RPM PEROVSKITE THIN FILM VACUUM

RESEARCH GRADE EQUIPMENT

Product Overview
The AF series Spin Coater is engineered for semiconductor plate-making, substrate surface coating, and perovskite thin film spin coating processes. Delivering stable rotation speed, fast startup response, and uniform film thickness, the instrument supports independent dual-stage speed 8000 rpm vacuum operation—low-speed spreading followed by automatic switching to high-speed spin coating—with the option to bypass the low-speed stage for small samples. Two models are available: AF-4A employs a permanent magnet motor with switching power supply speed regulation, providing stable operation from 1000–8000 rpm; AF-5A features variable frequency drive for stable operation up to 5000 rpm. Photoelectric pulse tachometry with a 556 time-base integrated circuit controls dual-stage spin coating timing. The unit incorporates a vibration-damping structure for low operational noise and comes complete with a matching vacuum pump. An LED digital display provides real-time speed readout with ±1% speed stability LED display accuracy.

Technical Specifications
PARAMETER DETAILS
Model Series AF-4A / AF-5A
Motor Type (AF-4A) Permanent Magnet Motor with Switching Power Supply Speed Regulation
Motor Type (AF-5A) Variable Frequency Drive
Speed Control Dual-Stage Independent Setting (Low-Speed Spread → High-Speed Spin)
Speed Measurement Photoelectric Pulse Tachometer, 556 Time-Base IC Timing Control
Display LED Digital Speed Display
Speed Stability ±1%
Film Thickness Uniformity (AF-4A) ±3%
Film Thickness Uniformity (AF-5A) ±5%
Motor Power (AF-4A) 40 W
Motor Power (AF-5A) 180 W
Substrate Size (AF-4A) φ5–φ100 mm (Silicon Wafers, ITO Glass, Perovskite Substrates)
Substrate Size (AF-5A) φ100–φ200 mm (Large-Format Substrates)
Vibration Control Built-in Vibration-Damping Structure, Low Noise
Vacuum Pump Included as Standard
Custom Configurations Other vacuum chuck sizes and configurations are available upon request. Please contact us via email for custom orders.

Dual-Stage Speed & Timing Parameters
MODEL STAGE SPEED RANGE TIMING RANGE
AF-4A Stage I (Spread) 500–2000 rpm 2–18 s
Stage II (Spin) 1300–8000 rpm 3–60 s
AF-5A Stage I (Spread) 500–1000 rpm 2–18 s
Stage II (Spin) 900–5000 rpm 3–60 s

Key Features & Advantages
  • Dual-Stage Independent Speed Programming: Low-speed spreading stage (2–18 s) automatically transitions to high-speed spin coating (3–60 s), enabling optimal film uniformity from solution dispensing through final thickness control. Low-speed stage can be bypassed for direct high-speed operation with small samples.
  • ±1% Speed Stability with LED Digital Display: Photoelectric pulse tachometry combined with 556 time-base integrated circuit control delivers precise speed regulation with real-time LED readout, ensuring batch-to-batch reproducibility for perovskite and photoresist coating processes.
  • Two Model Options for Different Substrate Ranges: AF-4A handles φ5–φ100 mm substrates including silicon wafers, ITO glass, and perovskite substrates; AF-5A accommodates φ100–φ200 mm large-format substrates, covering the full range from small research coupons to pilot-scale samples.
  • Low-Noise Operation with Integrated Vibration Damping: Built-in vibration-damping structure minimizes operational noise and mechanical disturbance, critical for laboratories where multiple instruments operate simultaneously in close proximity.

APPLICATION SCOPE: Photoresist spin coating for microelectronics laboratory and semiconductor plate-making. Perovskite precursor solution thin film preparation for photovoltaic research. Organic optoelectronic functional coating spin-coating prototyping. ITO glass and various substrate surface coating processes. Suitable for university optoelectronics laboratories and research institute thin film preparation facilities.
PACKAGING & DELIVERY: Each AF-4A or AF-5A spin coater is supplied as a complete system including the spin coater unit, matching vacuum pump, standard vacuum chuck, and power cable. The compact benchtop design allows direct placement on laboratory workstations without specialized installation. Operational guidance and user manual are included.
IMPORTANT NOTICE: Verify vacuum pump connection and confirm substrate hold-down on the chuck before initiating spin rotation. The dual-stage speed settings should be configured prior to operation—low-speed Stage I for solution spreading, high-speed Stage II for final film thickness control. For small samples, the low-speed stage may be disabled for direct high-speed operation. Clean the spin bowl and chuck surface after each use to prevent cross-contamination between coating materials. AF-4A achieves film thickness uniformity of ±3%; AF-5A achieves ±5%. Select the appropriate model based on substrate size and uniformity requirements. For detailed operational and safety instructions, consult the user manual prior to first use.
TAILORED SOLUTIONS FOR RESEARCH
Contact our engineering team for technical support or official quotations.
EMAIL: inquiry@atomfair.com
Manufacturer: Atomfair LLC
Brand: ATOMFAIR®

Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.

To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.

Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).

Additional information

Model

AF-4A, AF-5A

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