Description
Research-grade photomasks with ultra-high resolution capabilities for laboratory applications. Our precision photomasks support advanced microfabrication with exceptional pattern fidelity down to 15μm feature sizes.
| Technical Specification | Performance Value |
|---|---|
| Minimum Resolvable Feature | 15μm (0.015mm) |
| Minimum Aperture Size | 20μm (0.020mm) |
| Pattern Placement Accuracy | ±1μm |
| Substrate Options | Soda-lime glass, Quartz |
| Custom Design Service | 3-5 business day turnaround |
Design Specifications
- Accepts GDSII, DXF, and DWG file formats
- Minimum feature spacing: 10μm
- Maximum design area: 150×150mm
For custom photomask design consultation or technical support, contact our lithography specialists at inquiry@atomfair.com
Research Application Note: These high-precision photomasks are manufactured for research purposes in micro/nanofabrication and MEMS development. Not intended for industrial production use.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
