Description
Atomfair High-Performance Metallic Polishing Pads – 10pcs/Pack
Product Overview
Atomfair High-Performance Metallic Polishing Pads are premium magnetic-compatible consumables designed for metallographic grinding and polishing workflows. Part of the magnetic disc system, they work seamlessly with magnetic backing discs, diamond grinding discs, and all magnetic consumables. Available in standard diameters (D200mm, D250mm, D300mm) with custom sizes on request, they deliver reliable performance for laboratories and industrial quality control.
Key Advantages
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Extended Service Life: Offers up to 4 times longer lifespan compared to self-adhesive pads, reducing replacement frequency and costs.
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User-Centric Design: Enables easy, fast pad changes without adhesive breakdown; eliminates fingertip cutting risks for safer operation.
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Versatile Adaptability: Fits all magnetic plates and adapts to any metallographic process, from rough grinding to precision finishing.
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Clean Workflow: No adhesive residue, ensuring a cleaner polishing environment and consistent results.
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Value-Packed Packaging: 10 pieces per pack, balancing high-volume usage needs with convenient inventory management.
Polishing Pad Models & Specifications
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Model
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Description
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Recommended Compound/Grit
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|---|---|---|
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ASFL-M
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Synthetic silk pad with durable woven structure for mirror finishing of most metals
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3 Micron Diamond compound or finer
|
|
AST-M
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Extra hard synthetic silk pad on rigid backing (enhanced cutting action, flatness control)
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14 Micron Diamond compound or coarser
|
|
Chem-HM
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Specialized for chemical mechanical polishing (CMP) with colloidal silica suspension
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Colloidal silica suspension (e.g., Col-K)
|
|
Kan-M
|
Woven wool polishing cloth for ferrous & non-ferrous metals
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3 Micron Diamond compound
|
|
MRE-M
|
Synthetic flock on flexible waterproof carrier
|
6 Micron Diamond compound or finer
|
|
PSU-MM
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Non-woven chemo textile pad for general polishing
|
3 Micron Diamond compound
|
|
NSH-BM
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Short nap with woven backing for precision finishing
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3 Micron Diamond compound or finer
|
|
Lil Plus-M
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Soft short nap cloth ideal for mirror finishing
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3 Micron Diamond compound
|
|
NLH-M
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Longer stiff nap cloth for controlled material removal
|
6 Micron Diamond compound or finer
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Technical Specifications
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Parameter
|
Specification
|
|---|---|
|
Product Name
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High-Performance Metallic Polishing Pads
|
|
Packaging
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10 pieces per pack
|
|
Standard Diameter Options
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D200mm, D250mm, D300mm
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|
Customization
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Custom diameters available upon request
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|
Compatibility
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Magnetic backing discs, magnetic plates, all magnetic metallographic consumables
|
|
Application
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Metallographic grinding, precision polishing, chemical mechanical polishing (CMP); lab & industrial material preparation
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If you’re interested, have any questions, or have specific customization requirements, please feel free to contact us at inquiry@atomfair.com.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
