Description
High-purity 99.99% (4N) gold-tin alloy sputtering target with a composition of 80% gold and 20% tin by weight. Ideal for thin-film deposition in semiconductor and electronic applications. Precision-made with consistent quality for reliable performance.
| Product Name | Composition | Purity | Dimensions | Packaging | Packaging Size |
|---|---|---|---|---|---|
| Gold-Tin Alloy Target | Au:Sn = 80:20 wt% | 99.99% (4N) | φ101.6 × 3mm | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
