Description
This high-purity Cobalt Oxide (Co3O4) sputtering target offers 99.95% (4N) purity, ideal for thin-film deposition applications. The target is precision-bonded to a 3mm copper backing plate for enhanced thermal conductivity and stability during use. Suitable for research and industrial applications requiring consistent performance.
| Material | Purity | Dimensions | Backing Plate | Packaging | Packaging Size |
|---|---|---|---|---|---|
| Cobalt Oxide (Co3O4) | 99.95% (4N) | φ50 × 2mm | 3mm Copper | Piece | 1 |
Note: The target may decompose under certain conditions due to its inherent instability.
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
