Description
This Bismuth Aluminum (Bi/Al) alloy sputtering target offers high purity (99.5%) with a precise 90/10 wt% composition. Ideal for thin film deposition applications, it is manufactured using powder metallurgy for consistent quality. The target comes in a standard rectangular plate form for easy handling and installation.
| Material | Composition | Purity | Dimensions (mm) | Manufacturing Process | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Bismuth Aluminum Alloy | Bi/Al = 90/10 wt% | 99.5% | 50 × 50 × 2 | Powder Metallurgy | Plate | 1 pc |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
