Description
This AZO (Aluminum-doped Zinc Oxide) sputtering target offers 99.99% (4N) purity with a precise 98:2 wt% ZnO:Al2O3 composition. Ideal for thin film deposition in semiconductor and optoelectronic applications. Available in multiple diameters and thicknesses to suit various sputtering systems.
| Composition | Purity | Dimensions | Packaging |
|---|---|---|---|
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ50.8×3mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ50.8×4mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ50.8×5mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ76.2×6mm | 1 pc per pack |
| ZnO:Al2O3 = 98:2 wt% | 99.99% | φ80×3mm bonded with 2mm copper backing | 1 pc per pack |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
