Atomfair High-Performance Metallic Polishing Pads – 10pcs/Pack, D200-300mm, Magnetic-Compatible for Metallographic Finishing

Atomfair High-Performance Metallic Polishing Pads (10pcs/pack, D200-300mm) are magnetic-compatible, offering 4x longer life. Adhesive-free, easy to change, and safe, they deliver precise/mirror finishes for metals in lab/industrial metallography.

Description





Atomfair High-Performance Metallic Polishing Pads – 10pcs/Pack

Atomfair High-Performance Metallic Polishing Pads – 10pcs/Pack

Product Overview

Atomfair High-Performance Metallic Polishing Pads are premium magnetic-compatible consumables designed for metallographic grinding and polishing workflows. Part of the magnetic disc system, they work seamlessly with magnetic backing discs, diamond grinding discs, and all magnetic consumables. Available in standard diameters (D200mm, D250mm, D300mm) with custom sizes on request, they deliver reliable performance for laboratories and industrial quality control.

Key Advantages

  • Extended Service Life: Offers up to 4 times longer lifespan compared to self-adhesive pads, reducing replacement frequency and costs.
  • User-Centric Design: Enables easy, fast pad changes without adhesive breakdown; eliminates fingertip cutting risks for safer operation.
  • Versatile Adaptability: Fits all magnetic plates and adapts to any metallographic process, from rough grinding to precision finishing.
  • Clean Workflow: No adhesive residue, ensuring a cleaner polishing environment and consistent results.
  • Value-Packed Packaging: 10 pieces per pack, balancing high-volume usage needs with convenient inventory management.

Polishing Pad Models & Specifications

Model Description Recommended Compound/Grit
ASFL-M Synthetic silk pad with durable woven structure for mirror finishing of most metals 3 Micron Diamond compound or finer
AST-M Extra hard synthetic silk pad on rigid backing (enhanced cutting action, flatness control) 14 Micron Diamond compound or coarser
Chem-HM Specialized for chemical mechanical polishing (CMP) with colloidal silica suspension Colloidal silica suspension (e.g., Col-K)
Kan-M Woven wool polishing cloth for ferrous & non-ferrous metals 3 Micron Diamond compound
MRE-M Synthetic flock on flexible waterproof carrier 6 Micron Diamond compound or finer
PSU-MM Non-woven chemo textile pad for general polishing 3 Micron Diamond compound
NSH-BM Short nap with woven backing for precision finishing 3 Micron Diamond compound or finer
Lil Plus-M Soft short nap cloth ideal for mirror finishing 3 Micron Diamond compound
NLH-M Longer stiff nap cloth for controlled material removal 6 Micron Diamond compound or finer

Technical Specifications

Parameter Specification
Product Name High-Performance Metallic Polishing Pads
Packaging 10 pieces per pack
Standard Diameter Options D200mm, D250mm, D300mm
Customization Custom diameters available upon request
Compatibility Magnetic backing discs, magnetic plates, all magnetic metallographic consumables
Application Metallographic grinding, precision polishing, chemical mechanical polishing (CMP); lab & industrial material preparation

If you?re interested, have any questions, or have specific customization requirements, please feel free to contact us at inquiry@atomfair.com.