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Atomfair High Purity Indium Aluminum Alloy Sputtering Target (In/Al 90/10 wt%, 99.5%)
This Indium Aluminum (InAl) alloy sputtering target offers high purity (99.5%) with a precise 90/10 wt% composition. Ideal for thin film deposition applications, it’s manufactured using powder metallurgy for consistent quality. The target comes in a standard plate form with dimensions 50×50×2mm.
Description
This Indium Aluminum (InAl) alloy sputtering target offers high purity (99.5%) with a precise 90/10 wt% composition. Ideal for thin film deposition applications, it’s manufactured using powder metallurgy for consistent quality. The target comes in a standard plate form with dimensions 50×50×2mm.
| Product Name | Composition | Purity | Dimensions | Manufacturing Process | Packaging | Packaging Size |
|---|---|---|---|---|---|---|
| Indium Aluminum Alloy Target | In/Al = 90/10 wt% | 99.5% | 50×50×2mm | Powder Metallurgy | Plate | 1 pc |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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