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Atomfair High Purity 4N Indium Oxide (In2O3) Sputtering Target

This high-purity 99.99% (4N) Indium Oxide (In2O3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing plates for enhanced thermal conductivity. Ideal for research and industrial use in optoelectronics and transparent conductive coatings.

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Description

This high-purity 99.99% (4N) Indium Oxide (In2O3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing plates for enhanced thermal conductivity. Ideal for research and industrial use in optoelectronics and transparent conductive coatings.

Diameter (mm) Thickness (mm) Configuration Packing
25.4 3, 4, 5, 6 Standard 1 pc per unit
50 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit
50.8 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit
60 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit
76.2 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit
80 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit
100 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit
101.6 3, 4, 5, 6 Standard or with 2mm/1mm Cu backing 1 pc per unit

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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