Description
High purity 99.99% (4N) Hafnium Oxide (HfO2) sputtering target for thin film deposition applications. Available in standard and copper-backed configurations for versatile use in research and industrial processes.
| Product Name | Specification | Packaging | Pack Size |
|---|---|---|---|
| Hafnium Oxide Target (HfO2) | 99.99% purity, 25.4mm diameter × 5mm thickness | Piece | 1 |
| Hafnium Oxide Target (HfO2) | 99.99% purity, 50.8mm diameter × 3mm thickness bonded to 2mm copper backing plate | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
