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Atomfair High Purity 4N Hafnium Oxide (HfO2) Sputtering Target
High purity 99.99% (4N) Hafnium Oxide (HfO2) sputtering target for thin film deposition applications. Available in standard and copper-backed configurations for versatile use in research and industrial processes.
Description
High purity 99.99% (4N) Hafnium Oxide (HfO2) sputtering target for thin film deposition applications. Available in standard and copper-backed configurations for versatile use in research and industrial processes.
| Product Name | Specification | Packaging | Pack Size |
|---|---|---|---|
| Hafnium Oxide Target (HfO2) | 99.99% purity, 25.4mm diameter × 5mm thickness | Piece | 1 |
| Hafnium Oxide Target (HfO2) | 99.99% purity, 50.8mm diameter × 3mm thickness bonded to 2mm copper backing plate | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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