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Atomfair High Purity Zinc Aluminum Alloy Sputtering Target (ZnAl 1:1 at%, 99.9% Purity)
This high-purity Zinc Aluminum alloy sputtering target (1:1 atomic ratio) is ideal for thin film deposition applications. The irregularly shaped pieces ensure versatile usage in research and industrial processes.
Description
This high-purity Zinc Aluminum alloy sputtering target (1:1 atomic ratio) is ideal for thin film deposition applications. The irregularly shaped pieces ensure versatile usage in research and industrial processes.
| Product Name | Composition | Purity | Form | Packaging | Pack Size |
|---|---|---|---|---|---|
| Zinc Aluminum Alloy Target | ZnAl (1:1 at%) | 99.9% (3N) | Irregular Pieces | Standard | 1 kg |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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