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Atomfair High Purity 4N Tungsten Titanium Alloy Sputtering Target (W/Ti=90/10 wt%)

This high-purity 4N (99.99%) Tungsten Titanium (W/Ti=90/10 wt%) alloy sputtering target is ideal for thin film deposition applications. Available in multiple diameters and thicknesses, it is manufactured using powder hot-pressing for consistent quality.

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Description

This high-purity 4N (99.99%) Tungsten Titanium (W/Ti=90/10 wt%) alloy sputtering target is ideal for thin film deposition applications. Available in multiple diameters and thicknesses, it is manufactured using powder hot-pressing for consistent quality.

Composition Purity Dimensions Manufacturing Method Packaging Pack Size
W/Ti=90/10 wt% 99.99% (4N) Ø50.8×6mm Powder Hot-Pressed Piece 1
W/Ti=90/10 wt% 99.99% (4N) Ø100×5mm – Piece 1
W/Ti=90/10 wt% 99.99% (4N) Ø100×4mm – Piece 1

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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