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Atomfair High Purity Nickel Aluminum Alloy Sputtering Target (NiAl, 90/10 wt%, 99.5%)
This Nickel Aluminum (NiAl) alloy sputtering target is manufactured via powder metallurgy, offering high purity (99.5%) and precise composition (Ni/Al = 90/10 wt%). Ideal for thin film deposition applications, it comes in a standard size of 50x50x2mm with secure packaging.
Description
This Nickel Aluminum (NiAl) alloy sputtering target is manufactured via powder metallurgy, offering high purity (99.5%) and precise composition (Ni/Al = 90/10 wt%). Ideal for thin film deposition applications, it comes in a standard size of 50x50x2mm with secure packaging.
| Material | Composition (wt%) | Purity | Dimensions (mm) | Manufacturing Process | Packaging | Packaging Size |
|---|---|---|---|---|---|---|
| Nickel Aluminum Alloy (NiAl) | Ni/Al = 90/10 | 99.5% | 50 × 50 × 2 | Powder Metallurgy | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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