Description
This Nickel Silicon (NiSi) alloy sputtering target offers high purity (99.9%) with a precise composition of 97% nickel and 3% silicon by weight. Ideal for thin film deposition applications in semiconductor and coating industries. The target comes in a standard disc shape with excellent uniformity.
| Material | Composition | Purity | Dimensions | Form | Packaging |
|---|---|---|---|---|---|
| Nickel Silicon Alloy | Ni/Si = 97/3 wt% | 99.9% (4N) | φ80 × 6mm | Disc | 1 piece per pack |
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Disclaimer: Sold exclusively for laboratory research.
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