Description
This Aluminum Silicon Yttrium (AlSiY) alloy sputtering target offers high purity (99.9%) with a precise composition of Al:Si:Y = 94.3:4.5:1.2 wt%. Ideal for thin film deposition applications, it is manufactured using hot-pressing technology for consistent quality.
| Product Name | Composition (wt%) | Purity | Dimensions | Process | Packaging | Pack Size |
|---|---|---|---|---|---|---|
| Aluminum Silicon Yttrium Alloy Target | Al:Si:Y = 94.3:4.5:1.2 | 99.9% (4N) | 100mm × 4mm | Hot-Pressed | Piece | 1 |
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Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
