Your cart is currently empty!
Atomfair High Purity Cobalt Iron Alloy Sputtering Target (CoFe 90/10 at%, 4N)
This high-purity Cobalt Iron (CoFe) alloy sputtering target is manufactured with a precise composition ratio of 90/10 at% and 99.9% purity. Ideal for thin film deposition in research and industrial applications, it features a melting process for consistent quality.
Description
This high-purity Cobalt Iron (CoFe) alloy sputtering target is manufactured with a precise composition ratio of 90/10 at% and 99.9% purity. Ideal for thin film deposition in research and industrial applications, it features a melting process for consistent quality.
| Product Name | Composition | Purity | Dimensions | Packaging | Pack Size |
|---|---|---|---|---|---|
| Cobalt Iron Alloy Target (CoFe) | Co/Fe = 90/10 at% | 99.9% (4N) | ฯ50.8 ร 1.5mm | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Only logged in customers who have purchased this product may leave a review.
Related products
-
Atomfair 4N High Purity Chromium-Plated Tungsten Wire (99.99% Pure)
-
Atomfair 6N High Purity Intrinsic Silicon Sputtering Target (P-Type/N-Type/Undoped)
-
Atomfair 6N High Purity N-Type Silicon Sputtering Target (Si)
-
Atomfair 6N High Purity P-Type Silicon Sputtering Target (99.9999%)
-
Atomfair 6N High Purity Polycrystalline Copper Wire (99.9999% Pure, 0.25mm Diameter, 1kg Spool)
Reviews
There are no reviews yet.