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Atomfair High Purity Lanthanum Fluoride (LaF3) Sputtering Target 99.9% (4N) for Thin Film Deposition
Premium 99.9% pure Lanthanum Fluoride (LaF3) sputtering target for high-performance thin film applications. Available in standard and copper-backed configurations for enhanced thermal management. Ideal for optical coatings, semiconductor, and research applications.
Description
Premium 99.9% pure Lanthanum Fluoride (LaF3) sputtering target for high-performance thin film applications. Available in standard and copper-backed configurations for enhanced thermal management. Ideal for optical coatings, semiconductor, and research applications.
| Configuration | Dimensions | Packing |
|---|---|---|
| Standard Target | 99.9% purity, Ø101.6×3mm | 1 pc per unit |
| Copper-Backed Target | 99.9% purity, Ø101.6×3mm with 2mm copper backing (total thickness ≤6.35mm) | 1 pc per unit |
| Standard Target | 99.9% purity, Ø101.6×4mm | 1 pc per unit |
| Copper-Backed Target | 99.9% purity, Ø101.6×4mm with 2mm copper backing (total thickness ≤6.35mm) | 1 pc per unit |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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