Atomfair High Purity Bismuth Aluminum Alloy Sputtering Target (Bi/Al 90/10 wt%, 99.5%)

Description

This Bismuth Aluminum (Bi/Al) alloy sputtering target offers high purity (99.5%) with a precise 90/10 wt% composition. Ideal for thin film deposition applications, it is manufactured using powder metallurgy for consistent quality. The target comes in a standard rectangular plate form for easy handling and installation.

Material	Composition	Purity	Dimensions (mm)	Manufacturing Process	Packaging	Pack Size
Bismuth Aluminum Alloy	Bi/Al = 90/10 wt%	99.5%	50 × 50 × 2	Powder Metallurgy	Plate	1 pc

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.