Atomfair High-Purity 4N Bismuth Telluride (BiTe) Alloy Sputtering Target (Bi/Te=1/1 at%)

High-purity 4N (99.99%) Bismuth Telluride (BiTe) alloy sputtering target with 1:1 atomic ratio. Available in standard and copper-backed configurations for thin film deposition applications. Ideal for thermoelectric and semiconductor research.

Description

High-purity 4N (99.99%) Bismuth Telluride (BiTe) alloy sputtering target with 1:1 atomic ratio. Available in standard and copper-backed configurations for thin film deposition applications. Ideal for thermoelectric and semiconductor research.

Configuration Dimensions Purity Packaging
Standard BiTe Target ฯ†60ร—3mm 99.99% (4N) 1 piece per unit
Copper-Backed BiTe Target ฯ†60ร—3mm (BiTe) + 2mm Cu backing (total thickness โ‰ค5mm) 99.99% (4N) 1 piece per unit

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

Reviews

There are no reviews yet.

Only logged in customers who have purchased this product may leave a review.