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Atomfair High Purity Iron Manganese Alloy Sputtering Target (Fe/Mn 95/5 at%, 99.8% Purity)

This high-purity Iron Manganese (FeMn) alloy sputtering target is manufactured with a precise composition of 95% iron and 5% manganese (atomic percentage). With 99.8% purity and produced via melting process, it ensures consistent performance for thin film deposition applications. Available in multiple standard diameters with uniform 3mm thickness.

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Description

This high-purity Iron Manganese (FeMn) alloy sputtering target is manufactured with a precise composition of 95% iron and 5% manganese (atomic percentage). With 99.8% purity and produced via melting process, it ensures consistent performance for thin film deposition applications. Available in multiple standard diameters with uniform 3mm thickness.

Product Name Composition Purity Dimensions Packaging
Iron Manganese Alloy Target Fe/Mn = 95/5 at% 99.8% ฯ†50.8 ร— 3mm 1 piece per pack
Iron Manganese Alloy Target Fe/Mn = 95/5 at% 99.8% ฯ†60 ร— 3mm 1 piece per pack
Iron Manganese Alloy Target Fe/Mn = 95/5 at% 99.8% ฯ†76.2 ร— 3mm 1 piece per pack
Iron Manganese Alloy Target Fe/Mn = 95/5 at% 99.8% ฯ†80 ร— 3mm 1 piece per pack
Iron Manganese Alloy Target Fe/Mn = 95/5 at% 99.8% ฯ†100 ร— 3mm 1 piece per pack
Iron Manganese Alloy Target Fe/Mn = 95/5 at% 99.8% ฯ†101.6 ร— 3mm 1 piece per pack

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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