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Atomfair High Purity Hafnium Carbide (HfC) Sputtering Target, 99.5% (2N5), Bonded & Unbonded Options
High purity Hafnium Carbide (HfC) sputtering target with 99.5% purity, available in both bonded (with copper backing) and unbonded configurations. Ideal for thin film deposition in semiconductor and coating applications. Precision-engineered for consistent performance in vacuum environments.
Description
High purity Hafnium Carbide (HfC) sputtering target with 99.5% purity, available in both bonded (with copper backing) and unbonded configurations. Ideal for thin film deposition in semiconductor and coating applications. Precision-engineered for consistent performance in vacuum environments.
| Product Type | Purity | Dimensions | Configuration | Packing | Pack Size |
|---|---|---|---|---|---|
| Hafnium Carbide (HfC) Target | 99.5% (2N5) | ฯ60 ร 3mm | Unbonded | Piece | 1 |
| Hafnium Carbide (HfC) Target | 99.5% (2N5) | ฯ60 ร 3mm (bonded to 2mm copper backing) | Bonded | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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