Description
This manganese-aluminum alloy (AlMn) sputtering target offers 90/10 wt% composition with 99.5% purity, ideal for thin film deposition applications. Manufactured using powder metallurgy process, it features standard dimensions of 50×50×2mm with characteristic surface spots from production.
| Parameter | Specification |
|---|---|
| Material | Manganese-Aluminum Alloy (AlMn) |
| Composition | Mn/Al = 90/10 wt% |
| Purity | 99.5% |
| Dimensions | 50 × 50 × 2 mm |
| Manufacturing Process | Powder Metallurgy |
| Surface Characteristics | May exhibit production spots |
| Packaging Unit | Per piece |
| Package Type | Individual plate packaging |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
Every advanced material, component, equipment, and instrument in our catalog is backed by rigorous testing. We maintain strict internal quality management frameworks and align with CE conformity metrics to deliver transparent, reproducible performance data via our public open-science repository.
To request raw batch performance data, submit formal vendor registration paperwork, or execute a fast-turnaround R&D manufacturing loop, contact us at inquiry@atomfair.com.
Item is dispatched under the Atomfair Shipping & Delivery Framework (Free worldwide shipping on orders over $59 USD). Return is governed by the Atomfair Return & Refund Policy (7-day technical return window).
