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Atomfair High Purity Cobalt Aluminum Alloy Sputtering Target (CoAl, 90/10 wt%, 99.5% Purity)
This high-purity Cobalt Aluminum (CoAl) alloy sputtering target is manufactured via powder metallurgy, ensuring consistent quality and performance. With a composition of 90% cobalt and 10% aluminum by weight, it is ideal for thin-film deposition applications. The target is precision-cut to 50x50x2mm dimensions for easy integration into coating systems.
Description
This high-purity Cobalt Aluminum (CoAl) alloy sputtering target is manufactured via powder metallurgy, ensuring consistent quality and performance. With a composition of 90% cobalt and 10% aluminum by weight, it is ideal for thin-film deposition applications. The target is precision-cut to 50x50x2mm dimensions for easy integration into coating systems.
| Material | Composition | Purity | Dimensions | Manufacturing Process | Packaging | Packaging Size |
|---|---|---|---|---|---|---|
| Cobalt Aluminum Alloy (CoAl) | Co/Al = 90/10 wt% | 99.5% | 50 × 50 × 2 mm | Powder Metallurgy | Piece | 1 |
If you are interested or have any questions, please contact us at inquiry@atomfair.com
Disclaimer: Sold exclusively for laboratory research.
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