Atomfair 3C N-Type Silicon Carbide Substrate

A 3C-SiC single crystal substrate with N-type doping, optimized for high-speed and high-frequency applications. It features a lower band-gap and high saturation drift velocity. Suitable for advanced electronic and optoelectronic devices.

Description

A 3C-SiC single crystal substrate with N-type doping, optimized for high-speed and high-frequency applications. It features a lower band-gap and high saturation drift velocity. Suitable for advanced electronic and optoelectronic devices.

Property Value
Lattice Parameters a=4.349A
Stacking Sequence ABC
Mohs Hardness ≈9.2
Density 3.17g/cm³
Thermal Expansion Coefficient 3.8×10⁻⁶/K
Refraction Index @750nm n=2.615
Dielectric Constant c~9.66
Thermal Conductivity 3-5W/cm·K@298K
Band-Gap 2.36eV
Break-Down Electrical Field 2-5×10⁶V/cm
Saturation Drift Velocity 2.7×10⁷m/s

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Disclaimer: Sold exclusively for laboratory research.