Atomfair 2″ Zn-doped GaAs Single Crystal Wafer

A compound of gallium and arsenic, our GaAs wafer is a III-V direct-bandgap semiconductor with a zinc blende crystal structure. It’s ideal for manufacturing microwave ICs, MMICs, IR LEDs, laser diodes, solar cells, and optical windows. As a high-quality substrate, it enables epitaxial growth of other III-V semiconductors like InGaAs and AlGaAs, meeting rigorous standards for optoelectronic and high-frequency applications.

Description

Property Value
Crystal Material Single Crystal Gallium Arsenide, VGF/LEC grown
Orientation (100) or (111) a°±β°
Doping Zn
Diameter 50mm±0.25mm
Thickness 350±25um / 550±25um / 625±25um
Resistivity (1-10)x10Ω.cm
Mobility 3000~5000 cm²/V-sec
Doping Concentration (0.1-3.0)x10¹⁸/cm³
Etch Pit Density ≤710 cm⁻²
Primary Flat (0-1-1)±0.5deg, 16±1.0mm
Secondary Flat (0-1 1)±5.0 deg, 8±1.0mm
Front Surface Polished in Epi-ready Prime grade
Back Surface Polished / Lapping or Etched
Epi-ready Yes