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Deposition & Thin-Film Materials
Showing 129–144 of 381 results
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Atomfair High Purity Cobalt Oxide (Co3O4) Sputtering Target, 4N (99.95%), Bonded with 3mm Copper Backing Plate
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Atomfair High Purity Cobalt Powder (99.8%) for Industrial Applications
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Atomfair High Purity Cobalt Rod (4N5, 99.95%) – Precision Ground & Polished
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Atomfair High Purity Cobalt Silicon Alloy Lump (CoSi, 99.5% at%, Co/Si=1/1)
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Atomfair High Purity Copper (Cu) Sputtering Target – 4N to 6N Grade for Thin Film Deposition
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Atomfair High Purity Copper Aluminum Alloy Sputtering Target (CuAl 90/10 wt%, 99.5%)
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Atomfair High Purity Copper Aluminum Tin Alloy (CuAlSn) Chunks – 93/5/2 wt% (4N Purity)
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Atomfair High Purity Copper Bonding Wire (Cu) – 18ฮผm & 25ฮผm Diameter
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Atomfair High Purity Copper Nickel Alloy Block (CuNi) – 4N Grade
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Atomfair High Purity Copper Nickel Alloy Sputtering Target (CuNi 50/50 at%, 4N)
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Atomfair High Purity Copper Nickel Tin Alloy Granules (CuNiSn 77/15/8 wt%) – 99.9% Purity
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Atomfair High Purity Copper Nickel Zinc Alloy Block (CuNiZn) – 4N Grade
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Atomfair High Purity Copper Oxide (CuO) Sputtering Target, 99.9% (3N)
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Atomfair High Purity Copper Rod (Single Crystal/Oxygen-Free) – 5N, 4N Grades
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Atomfair High Purity Copper Yttrium Alloy Block (Cu3Y1, 99.5%)
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Atomfair High Purity Copper Zirconium Alloy Lump (CuZr, 1:1 at%, 4N5)