Atomfair High Purity 4N Tungsten Trioxide (WO3) Sputtering Target

This high-purity 99.9% (4N) tungsten trioxide (WO3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in optics, electronics, and energy storage.

Description

This high-purity 99.9% (4N) tungsten trioxide (WO3) sputtering target is designed for thin film deposition applications. Available in multiple diameters and thicknesses, with optional copper backing for enhanced thermal conductivity. Ideal for research and industrial use in optics, electronics, and energy storage.

Diameter (mm) Thickness (mm) Configuration Packing
25.4 3, 4, 5, 6 Standard 1 pc per pack
50 2, 3, 4 Standard or with 2mm copper backing 1 pc per pack
50.8 3, 4, 5 Standard or with 1-2mm copper backing 1 pc per pack
60 3, 4, 5, 6 Standard 1 pc per pack
76.2 3, 4, 5, 6 Standard 1 pc per pack
80 3, 4, 5, 6 Standard 1 pc per pack
100 3, 4, 5, 6 Standard 1 pc per pack
101.6 3, 4, 5, 6 Standard 1 pc per pack

If you are interested or have any questions, please contact us at inquiry@atomfair.com

Disclaimer: Sold exclusively for laboratory research.

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